Mass Spectrometers
Our wide range of powerful, versatile, and proven mass spectrometry-based solutions deliver a new level of understanding and control in vacuum and gas-related applications to customers.
- Gas Analyzers
- Mass Spectrometers
- Tunable Filter Spectrometers
- FTIR Gas Analyzers
- Process Sense™ NDIR End Point Detector For Chamber Clean
- Vacuum Quality Monitor Systems
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Residual Gas Analyzers
Residual Gas Analyzers are an effective tool to analyze system gas loads resulting from real leaks, virtual leaks or chamber wall outgassing. RGAs have a number of advantages over traditional, dedicated gas leak detectors including the ability to differentiate between different gas species, comparable sensitivity levels, the ability to detect internal or "virtual" leaks and to detect and analyze outgassing problems.
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Vacuum Process And Chamber Environment Monitors
Our process monitors are innovative in-situ process monitoring instruments that are fully integrated, application-specific packages, including component residual gas analyzers (RGAs), analytical equipment, and control software. Process mass spectrometers are used in varied applications, including; Semiconductor, Thin Film (CVD, Etch, PVD and degas), pharmaceutical lyophylization and bulk gas purity monitoring.
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Atmospheric Pressure Gas Analyzers
The Cirrus™ single-quadrupole mass spectrometers are powerful analytical tools for a wide range of laboratory and industry-based gas analysis applications. The Cirrus family, featuring the Cirrus™ 3 and Cirrus™ 3-XD atmospheric pressure gas monitoring systems are ideal for analysis of bulk gas, gas composition, and detection of trace gasses and contamination. These powerful, versatile and customizable platforms, when combined with Process Eye™ Professional software and its recipe-based control, can significantly boost your productivity.
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Process And Chamber Monitoring Software & Systems
MKS process and monitoring solutions feature real-time, web-enabled, hardware, software, and systems to support a variety of tools and processes. These solutions improve performance and yield while reducing tool damage and false alarms.
