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- Taylor Dynamometer, Inc.
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Towing Dynos for Full-Sized Cars & Light Trucks
Designed to maintain 2,248 to 5,620 lb (10,000 to 25,000 N) of constant drawbar pull, our towing dynamometers for full-sized cars to light trucks are powered by an industrial generator to provide unlimited testing at low speeds. Each model features aluminum frame, independent suspension, aero dynamic body and wireless touchscreen controller.
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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X-Ray Cameras for Soft X-Ray, VUV, and EUV Applications
SOPHIA® XO
Teledyne Princeton Instruments
SOPHIA® XO offers high-sensitivity (>95% QE) and high-speed for the widest range of VUV and x-ray detection, with thermoelectric cooling up to -90℃ and high frame rates. With a rotatable, industry-standard CF flange and high-vacuum seal design the software-selectable gains and readout speeds make this camera well suited for UHV applications.
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Detectors
Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Ultraviolet Light Distribution Measurement Film
UVSCALE
UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Extreme Environment Sensors
Kaman Fuzing & Precision Products
For high pressure, low temperature, and high temperature applications* For applications requiring high accuracy, high reliability, and structural integrity.* Operating temperatures from -320°F to +1000°F (+1200°F short term).* Displacement systems withstand pressures up to 3500 or 5000 psi.* Dual-coil sensor design effectively minimizes radiation effects.* Hermetically sealed and laser welded.* Unaffected by environmental contaminants.
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PCE-2000UV Ultraviolet LED/Module Radiation Measurement System
Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV Ultraviolet LED/Module Radiation Measurement System can realize the measurement of the relative spectral power distribution of ultraviolet LED, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and total radiation flux in specific wavelength.
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Reading Lights
Our Carat® lights offer a wide range of fully customized reading light solutions crafted for your unique needs.
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Light Meter
LI-250A
The LI-250A is a portable meter that displays the output from any LI-COR light sensor that has a cable terminated with a BNC connector. It shows instantaneous values or 15-second averages of values from a sensor.
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Light Sources
These external units provide illumination which is transmitted to the viewing instrument by a light guide cable, and then through the scope via the integral fiber bundle to the viewing tip.
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Ultraviolet Microscope
UVM-1
The UVM-1™ is a UV microscope that also can image in the visible and NIR. This UV-visible-NIR microscope embodies both advanced optics for cutting edge UV, color and NIR imaging and visualization. The system is a flexible design, very easy to use and very durable. It is designed with cutting edge CRAIC optics for the highest image quality and to give years of service.
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Light Source
UVF-502S
In combination use with the uniform exposure unit, selection of uniform irradiation area in the range of 80mm200mm is possible.
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Light Measurement
Light is produced from many natural and artificial sources. Controlling light and having an accurate understanding of its output, directionality and the appearance of what it irradiates is key to product development, quality and the success of a light source. Here are just a few examples of why Labsphere is leading the industry in light measurement.
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Light Sources
Bentham's range of light sources has evolved to suit the requirements of our systems and their users and now offers single or multiple sources from 200nm to 40m:
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Light Sources
There are many low cost artificial light sources used for illumination or for industrial applications: tungsten or halogen bulbs, fluorescent lamps, LED lamps etc. Some of these sources have regulated intensity of emitted light. However, there very few calibrated light sources of precisely known parameters. A light source can be considered as calibrated when its user can precisely regulate its photometric/radiometric parameters like luminance (or illuminance), radiance (or irradiance) at defined spectrum of interest. Such light sources are needed in many applications among them, in systems for testing night vision devices, VIS-NIR cameras and SWIR imagers. Inframet offers a series of calibrated light sources that can be divides into three groups:
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Light Monitor
LM-101
The LM-101 Light Monitor system provides an efficient and cost effective solution for monitoring coating thickness in real time. It consists of the LM-101 Light Monitor, LM-101A/AS light source, and Detector assembly.
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Light Meters
LXP-10B
The new LXP digital light meter family allows for a very precise measurement of illuminanace. Thanks to very high resolution (resolution 0.01 lx ) allows for escape route emergency light measurement. All of three light meter have built-in memory for measurement result storing, and additional function making work much easier.
