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2 MHz RF Plasma Generators
NOVA® Series
The NOVA ; RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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DVI Video Matrix Switch with Audio Option up to 32x32
SM-nXm-DVI-LCD
The VEEMUX® DVI Video Matrix Switch routes video from up to 32 single link digital DVI video sources (computers, DVD players, satellite receivers, etc.) to up to 32 displays (LCD monitors, Plasma screens, DLP HDTVs, projectors, etc.) and stereo audio speakers (with audio option).
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Mini HDMI Pattern Generator 3D
32645
This compact desktop pattern generator allows you to test a range of different display devices ranging from HDMI/DVI-D capable monitors up to HD 3D Plasma, LCD TVs and projectors. Its capable of outputting a wide range of test patterns, screen resolutions and refresh rates. Ideal for use in testing environments, service departments, broadcasting and video production applications, it's also compatible with DVI-D capable displays when using a suitable adapter.
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Optoelectronics
Vishay is the world's number-one manufacturer of infrared components, with a portfolio that includes infrared receivers, emitters, IrDA transceivers, optocouplers, solid-state relays, and touch panels. Visible LEDs, optical sensors, photo detectors, plasma displays, and 7-segment displays complete Vishay's optoelectronics offerings.
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ICP Plasma System
The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Microwave Plasma Subsystems
AX2600 And AX2700
The AX2600 and AX2700 Microwave Plasma Delivery Subsystems are complete and highly reliable solutions for the cost-effective generation and safe delivery of atomic species to the wafer. Available in 3 kW, these highly reliable, field-proven plasma delivery subsystems deliver highly concentrated atomic species. Suitable for multiple chemistries, the high speed and precision of this plasma system’s automatic tuning guarantees immediate ignition and fast transition from plasma conditions for high productivity. Robust closed-loop control ensures high accuracy, precision, and optimal repeatability of the process from wafer to wafer and system to system.
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Plasma Emission Controller
RU-1000
The optical technology developed by HORIBA and the gas control technology offered by HORIBA STEC have been combined to make further advances in plasma control technology. The plasma emission controller RU-100 offers; faster deposition by controlling the transition region, optimized distribution in a large-area, high-capacity chamber, plasma stabilization in a long sputtering process (stable deposition), and mixture optimization of compounds for reactive sputtering.
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Plasma Etcher / Asher
PA-3000-A ETCHER
Process chamber with plasma view window and full access hinged door. RF hot process shelves with opposing ground electrodes. Throttle valve. Capacitance manometer. Internal pumping system with option for Fomblin filled chemical series mechanical pump. Flow control electronics and cabinet. Up to four mass flow control assemblies can be incorporated into our system. RF matching network and 600 watt maximum power supply. Fully enclosed cabinet. Custom internal fixturing to accommodate specific substrate shapes and sizes. Plasma gas selection for optimal performance.
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Plasma Power Generators
Advanced Energy’s field-proven, Precision PowerTM solutions offer extreme control, peerless arc handling, and cutting-edge match technology. Unlock new fabrication processes and benefit from our plasma power generators’ comprehensive capabilities.
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Plasma Processing Systems
PlasmaSTAR
The PlasmaSTAR® Series of Plasma Processing Systems from Axic, Inc. defines a new concept in barrel plasma processing. The systems are based on a modular design concept. Starting with a universal base unit, multiple electrode modules are available for easy insertion into the base unit. You will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma.
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Plasma Process Monitors
Plasma process monitors to monitor plasma emissions during semiconductor manufacturing processes such as etching, sputtering and CVD.
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Plasma Profiling TOFMS
PP-TOFMS
Plasma Profiling TOFMS addresses the needs of materials scientists across a wide range of application areas. PP-TOFMS provides fast elemental depth distribution of any inorganic material. The speed and ease of use of PP-TOFMS permit to reduce optimization time of growth processes as many research scientists strive to reduce the time from discovery to applications of new materials.The simultaneous full coverage of TOFMS available for each point of depth permits the detection of non suspected contamination. This is key for failure analysis and optimization of thin film processes that tend to no longer be based on ultra-high grade methods (i.e. ink jet printing…).
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Remote Plasma Source
Xstream
The highly efficient Xstream® RPS dissociates large volumes of NF3 and quickly cleans chambers, improving your overall tool performance. Its plasma chamber showcases high-purity aluminum alloy and patented cooling capabilities. Built to last for years without repair or expensive chamber coatings, the Xstream RPS is the smart choice for dependability and efficient performance.
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Remote Plasma Source
MAXstream
Advanced Energy’s MAXstreamTM line is the next generation of remote plasma sources for chamber cleaning. The MAXstream is available in 3, 6, 8, 10, and 12 SLPM NF3 flow rates to optimize price and performance.
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Remote Plasma Sources
Equip your manufacturing and abatement processes with high functionality and exceptional reliability. Customize your chemistry. Expand your operating range. Deliver higher process rates. Advanced Energy’s remote plasma sources offer sophisticated options in streamlined designs.
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Remote Plasma Sources
Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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RF Plasma Generators
Choose from a broad range of RF plasma generators and access unique features for configuration, control, and application requirements. From various mounts and sizes to full digital control and plasma dynamic response, our RF generators can ignite your process innovation.
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UV Plasma Sources
UVS300|UVS 10/35
The UVS300 and UVS 10/35 are UV Plasma sources with high intensity, working with different gases.
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Display
XY Plotter
XY Plotter is used for visualizing (form evaluation) the transfer characteristics of two values to be measured. The following instruments can be used for transfer characteristics: DC and AC voltmeters, a selective AC voltmeter, a frequency meter, and a phase meter. Characteristics can be displayed in 3 planes (XY, XT, and YT), as well as in a three-dimensional (XYT) view.
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Display
Multichannel Oscilloscope
Multichannel Oscilloscope is used for evaluating signal shape and instant value measurement. It is possible to simultaneously display several signals within the same period, each having their own units of measurement. To compare signals, it is possible to display their oscillograms on the same coordinate axes. A simple and user-friendly cursor control and diagram scaling allow for studying process changes in general and in detail.
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Display
Data Processing and Result View
The program allows to simultaneously download multiple data files obtained by means of ZETLab programs, as well as to view and edit corresponding data in the graphic and table format.
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Display
Signals Gallery
Program “Signal gallery” is used for viewing and analysis of the recorded signal (whether from HD or in remote way).
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Display
Seismograph
Seismograph program is used for continuous data representation by a large amount of channels (simultaneously and in identical scale – for the purpose of timely detection of the events occurring in the system).
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Display
XYZ Oscillograph
XYZ Oscillograph is a program assessing signal forms and displaying signal parametric dependence.
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Displays
REINHARDT System- und Messelectronic GmbH
We have developed our own family of displays. They present the measured values, even without PC, with audience appeal and easily legible
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Displays
Curtiss-Wright Defense Solutions
Our high-definition (HD) displays are designed for use with the industry's most popular sensors, including forward-looking infrared (FLIR) and long-range daylight video cameras. Readable in all light conditions, these rugged displays provide anytime readability to ensure you won't miss a moment of the action, no matter your application. With leading-edge functionality, including multiple video inputs, picture-in-picture, quad view, and video freeze-frame, our displays are ready for many roles, including moving map or quad view operator displays, and are ideal for use with our fully integrated video management system (VMS).
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Chemical Downstream Plasma Source
The AX7610 is a microwave plasma source for remote plasma applications. With replaceable quartz or sapphire plasma tubes, the AX7610 downstream source offers configuration flexibility to meet the most demanding application process parameters. The quartz tube version is ideally suited for production of atomic oxygen, nitrogen or argon. The sapphire tube version is compatible with much more severe CF4 CHF3 and NF3 chemistries.
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Inductively Coupled Plasma Spectrometry
Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
