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Wafer Mapping
Identify semiconductor performace across a wafer.
See Also: Wafer, Mapping, Wafer Thickness, Wafer Failure Analysis, Wafer Edge, Wafer Resistivity, Wafer Probes, Wafer Probers, Wafer Inspection, Wafer Maps
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Wafer Mapping Sensor
M-DW1
Panasonic Industrial Devices Sales Company of America
To provide better safety and improved sensing accuracy, Panasonic studied the requirements for future Wafer Mapping Sensors to ultimately develop the LED Beam Reflective Type Wafer Mapping Sensor, M-DW1. This Sensor uses LEDs as a light source for safe operation and a 2-segment receiving element for higher accuracy in wafer detection.
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Wafer & Die Inspection
SemiProbe wafer inspection system (WIS) examines, locates and identifies defects created during wafer manufacturing, probing, bumping, dicing or general handling. This provides microelectronic device manufacturers with accurate, timely quality assurance and process information. The WIS has single sided and double sided wafer mapping capabilities and can improve efficiency, reduce manufacturing costs, increase yields and shorten time to market.
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TFProbe Wafer Measurement Tools
Angstrom Sun Technologies, Inc.
Angstrom Sun Technologies Inc offers optical measurement and inspection systems for semiconductor and related industries. Its core products include wafer measurement systems, spectroscopic ellipsometers, thin film reflectometers, and microspectrophotometers. TFProbe wafer measurement systems, TFProbe WM series, measure wafer thickness, warp, bow, flatness, step/bump height, trench depth. TFProbe WM systems are based on confocal optical method with advantages of non-contact, non-destructive, long working distance, fast data acquisition, full mapping functions. Particularly, with integration with our thin film measurement technique, a total solution for thickness measurement covers from a few angstroms to several millimeters. Another key feature is that all our tools are upgradable in future.
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Automated Discrete Semiconductor Tester (ATE)
5000E
Same Proven Technology as all 5000 Series Testers. High Speed Single Test Measure. Capable of Testing Multiple and Mixed Devices. 1KV Standard, 2KV Optional. 1NA to 50A Standard, 100A Optional. 0.1NA Resolution. Complete Self Test. Auto-Calibration. RDSON to 0.1MOHM Resolution. Windows Application Software. Optional Scanner. Optional Wafer Mapping. Optional Curve Trace. MOSFET, IGBT, J-FETTriac, SCR, Sidac, Diac, Quadrac, STS, SBS Transistor, Diode, Opto, Zener Regulator, MOV, Relay. UNDER $23,000.00
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Bow and Global Film Stress Measurement
128 Series
Bow and Global Film Stress Measurement.Non-contact full wafer stress mapping for semiconductor and flat panel application.Dual Laser Switching Technology.
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DUV-NIR Spectroscopic Reflectometry
FilmTek 2000
Scientific Computing International
Automated metrology system designed for rapid, reliable, and accurate characterization of nearly any unpatterned thin film. Fully user-customizable wafer mapping capabilities rapidly generate 2D and 3D data maps of any measured parameter. Capable of simultaneous determination of multiple film characteristics within a fraction of a second per site.
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Epi Thickness & Composition System
Element
The Element system is the tool of record for wafer suppliers for high speed impurity mapping and epi thickness measurement. It is the only tool on the market with the unique combination of transmission and reflection based technology. This system is the industry standard for dielectric monitoring.
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kSA Scanning Pyro
For use on Veeco K465i and EPIK700 MOCVD reactors, the kSA Scanning Pyro performs automated temperature mapping in order to measure temperature variations across wafer carriers and wafers. Use it to tune heater zones and optimize process and hardware to achieve higher yields, wafer uniformity and device performance.
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Micro-spot DUV Spectroscopic Reflectometry
FilmTek 2000 PAR
Scientific Computing International
A low-cost solution for high-throughput, fully-automated mapping of patterned wafers for development and production environments. Utilizes patented parabolic mirror technology to measure wavelengths from DUV to NIR with a spot size as small as 13µm. Fully user-customizable wafer mapping capabilities rapidly generate 2D and 3D data maps of any measured parameter.
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Motion Control Components
- Control of versatile robotic structures, including "yaw", "pitch" and "roll" motion capabilities- S-curve velocity profiling, based on polynomial splines and Bernstein-Bezier curves- Continuous path control in multi-segment smooth trajectories- Synchronization of multiple axes- Trajectory control with user defined velocity profiles- Kinematical modeling of open and closed loop mechanisms- Singularity consistent path planning and singularity avoidance- Optimal PID filter tuning- Automatic adjustment with respect to the surrounding equipment (cassettes, process stations, etc.)- Tilting capabilities in terms of the end-effector frame- Compensation for deflection of the end effector, the manipulated object and geometric in accuracies of the arm Scanning and Aligning Features- Wafer mapping based on through-beam or reflective sensors- Automatic detection of the planarity and the center of wafers and FPD- Non contact FPD aligning. Misalignment compensation on the fly Safety- Programmable travel limits- Position tracking error detection- Amplifier overload protection- Emergency stop
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Semiconductor Technology, Micro Scriber + Meters For Contact Angle And Surface Tension
SURFTENS WH 300
Optik Elektronik Gerätetechnik GmbH
The leading equipment for professional use in 200 and 300 mm wafer processing in semiconductor technology. SURFTENS WH 300 is equipped with a 3 axis wafer robot, wafer scanner, loadport for 200 and/or 300 mm wafers, fan filter unit, notching system. Suitable for any cleanroom class it features the automatic mapping of contact angles on wafers for up to 25 wafers.New: with SECS/GEM Interface!
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Pressure Mapping
HIGH SPEED I-SCAN® SYSTEM
Tactile pressure and force measurement system capable of measuring
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Pressure Mapping
WIPER
Evaluate wiper blade force profiles and interface pressure distribution.
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Pressure Mapping
NIP PRESSURE MEASUREMENT SYSTEM
A completely wireless system for measuring nip pressure between rollers in real-time
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Pressure Mapping
GRIP™ SYSTEM FOR R&D
Tactile pressure sensing system that quantifies forces applied by the human hand while grasping objects.
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Pressure Mapping
TIRESCAN
Complete pressure imaging system for conducting tire tread analysis.
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Pressure Mapping
CONFORMAT® SYSTEM FOR R&D
Tactile pressure measurement system utilizing a fully conforming array pressure sensor.
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Pressure Mapping
BPMS
Measure pressure distribution between the human body and support surfaces such as seats, mattresses
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Half-Cell Corrosion Mapping
XCell
Giatec XCell™ is a smart tablet-based NDT probe for fast, accurate and efficient detection and on-site analysis of corrosion in reinforced concrete structures. Giatec XCell™ meets all the requirements of the ASTM C876 standard specification.
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Photoluminescence Mapping System
VS6845A
Industrial Vision Technology Pte Ltd.
With its unique optical design technology, the System detects and classifies defects that affect yield and uses advanced photoluminescence (PL) technology to enable real-time monitoring of MOCVD production processes.
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PORTABLE PRESSURE MAPPING
I-SCAN® HANDHELD SYSTEM
Handheld pressure measurement system for collecting tactile pressure data.
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Professional Mapping Drone
eBee Plus
eBee Plus system includes: long-flying fixed-wing airframe; photogrammetry-optimised RGB sensor; next-gen flight & data management software . The eBee Plus can map more square kilometres per flight. The eBee Plus includes built-in RTK/PPK functionality that can be activated either out of the box or later when required. The eBee Plus offers a camera to suit every application, including the senseFly S.O.D.A. (supplied), the first camera designed for photogrammetric drone mapping.
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Wafer Analyzer
RAMANdrive
RAMANdrive is the specialized Raman microscope for wafer analysis equipped with our dedicated 300 mm stage. RAMANdrive gives you an ultra-fast, highest resolution analysis of the whole wafer with unique stability and accuracy
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Wafer Bonder
AML
Wafer bonding has found many applications in the field of MST, MEMS and micro engineering. These include the fabrication of pressure sensors, accelerometers, micro-pumps and other fluid handling devices. The process is also used for first-order packaging of silicon microstructures to isolate package-induced stresses. The OAI AML Wafer Bonder facilitates both the alignment and bonding to be performed in-situ, in a high vacuum chamber. For anodic bonding the wafers are loaded cold and heated in the process chamber. For high accuracy alignment the wafers are aligned and brought into contact only after the process temperature has been reached, thus avoiding differential thermal expansion effects which can compromise alignment. The AML Wafer Bonder is excellent for anodic bonding, silicon direct and thermal compression bonding applications. These features enable the bonder to be used with virtually any processing tool.
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Wafer Chucks
American Probe & Technologies, Inc.
High Performance Chuck for your needs Introducing the American Probe & Technologies’ HC-6000 series of thermal chucks,
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Wafer Chucks
ARC, in addition to fabricating Wafer Chucks from aluminum, is also known for its ability to work in hard to machine materials such as hardened (50-62 Rockwell) metal alloys, fired ceramics, e.g. SiC and glasses. These materials are often ideal for semiconductor equipment applications due to their ability to hold critical dimensions and tolerances. ARC specializes in surface grinding and lapping these materials to precision flatness and parallelism specifications needed for semiconductor wafer chuck requirements.
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Wafer Manufacturing
Scientific Computing International
A procedure composed of many repeated sequential processes to produce complete electrical or photonic circuits on semiconductor wafers in semiconductor device fabrication process.
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WAFER MVM-SEM
E3300 Family
The E3310 is a WAFER MVM-SEM* for next generation wafers, supporting 1Xnm node process development and volume production at the 22nm node and beyond. With its high-speed carrier system employing a dual arm vacuum robot, and low-vibration platform to improve measurement accuracy, the E3310 delivers high throughput and performance for wafer measurements. Its multi detector configuration and unique 3D measurement algorithm also enable stable, high-accuracy measurement of 3D transistor technologies such as FinFET. The E3310 makes a significant contribution to reducing process development turnaround time and improves productivity for next-generation devices.
